90% Welding Flux Boron Powder Amorphous B Boron Used in Metallurgy
90% amorphous boron powder is a high-purity and high-activity functional material specially developed for metallurgical smelting and welding flux applications. With 90% effective boron content and strictly controlled residual impurities, this amorphous boron features a disordered atomic structure, providing abundant surface active points and higher chemical reactivity than conventional crystalline boron. It serves as a reliable deoxidizer, denitrifier and flux additive, widely applied in steel smelting, alloy modification and precision welding industries.
$20,000.00 – $40,000.00 / MT
Description
90% Welding Flux Boron Powder Amorphous B Boron Used in Metallurgy
Product Features
- Based on the specific gravity of boron, it is divided into amorphous boron and crystalline boron. Amorphous boron has a specific gravity below 1.73 g/cm³.
- The widely used amorphous boron is formed by reduction at around 1000℃, of which 60% is α-rhombic crystalline boron,And 40% is amorphous boron, a mixture of crystalline and amorphous.
- Due to its small particle size and uniform distribution, amorphous boron has high activity.


AVERAGE CHEMICAL COMPOSITION(TYPICAL)
| ITEM | B90 | B95 | B99 | B99.9 |
| B | 90-95 | 95-99 | 99-99.9 | 99.9MIN |
| O | 3.0 MAX | 2.5MAX | 1.0MAX | 0.01MAX |
| MG | 5.0 MAX | 2.0MAX | 0.1MAX | 0.01MAX |
Available size:
| Micrometer level | D50:3 micrometers |
| Nanometer level | 600-700 nanometers. |
Applications:

1. Amorphous boron powder with a boron content of 95-99% possesses high mass heat and volumetric heat, resulting in a large specific impulse. It is a high-quality material for rocket propellants and explosives.
2. Boron powder with a boron content of over 99% is an electronic material that acts as a deoxidizer, antioxidant, and catalyst.It plays a crucial role in semiconductor manufacturing, influencing the conductivity and crystal structure of semiconductors, thereby affecting the performance and reliability of components. It is widely used in high-end products requiring high boron purity, such as electronic materials and semiconductor diffusion.
3. Amorphous boron powder with a purity of 99.9% is used in the production of solar silicon wafers as a substrate dopant for P-type silicon wafers and for boron emitter diffusion in N-type silicon wafers.
4. High-purity boron powders of 5N and 6N can be used as dopants in P-type semiconductors to alter their conductivity, enabling the production of high-purity silicon wafers.
Packaging:
Vacuum foil bags + drums + pallets




